Surface Profile for Monolayer Chemical Vapor Deposition Synthesis of 2D-Materials
Sumit Kumar
, Sandeep Kumar Garg
Chemical Vapor Deposition, Monolayer, Surface Morphology, 2D-Materials.
Frequency analysis of surface morphological growth for CVD monolayer has been done. Si surface by 10 keV Ar+ ion bombardment at an oblique angle incidence of 45° for various ion fluences of order ~1017 Ar+ cm-2 at room temperature is compared with 60°. Surface morphology of low energy Ar+ ion sputtering has been investigated by atomic force microscopy. A detailed analysis of the spectral densities and dynamic plots of Si ripple is discussed within the framework of statistical models related with Ion Beam Sputtering induced pattern formation process. The dynamic scaling behavior of Si ripples produced by low energy Ar+ ion erosion has been done at an angle of 35˚, 45˚ & 60˚ respectively. The surface profiles spectrum of various parameters shows the clear pictures of height, kinks, roughness and ripples wavelength that was introduced by the radiation.
"Surface Profile for Monolayer Chemical Vapor Deposition Synthesis of 2D-Materials", IJSDR - International Journal of Scientific Development and Research (www.IJSDR.org), ISSN:2455-2631, Vol.11, Issue 1, page no.b182-b185, January-2026, Available :https://ijsdr.org/papers/IJSDR2601121.pdf
Volume 11
Issue 1,
January-2026
Pages : b182-b185
Paper Reg. ID: IJSDR_306997
Published Paper Id: IJSDR2601121
Downloads: 000195
Research Area: Physics All
Country: Patna, Bihar, India
ISSN: 2455-2631 | IMPACT FACTOR: 9.15 Calculated By Google Scholar | ESTD YEAR: 2016
An International Scholarly Open Access Journal, Peer-Reviewed, Refereed Journal Impact Factor 9.15 Calculate by Google Scholar and Semantic Scholar | AI-Powered Research Tool, Multidisciplinary, Monthly, Multilanguage Journal Indexing in All Major Database & Metadata, Citation Generator
Publisher: IJSDR(IJ Publication) Janvi Wave
